Optical Properties of Nanometer Nickel Oxide Epitaxial Films on Linbo3 Substrates

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Resumo

Semiconductor structures based on nickel oxide grown on LiNbO3 substrates were fabricated using magnetron sputtering. The optical properties of NiO films on LiNbO3 substrates were studied in the wavelength range of 250…800 nm, and transmission and reflection spectra of these structures were simulated. The dispersion of the complex refractive index of the grown films was obtained, which ensures good agreement between the calculated and experimental transmission and reflection curves. These studies made it possible to determine the thickness of the grown epitaxial films using optical methods and compare with the results obtained based on the film growth rate and atomic force microscopy methods.

Sobre autores

S. Averin

Fryazino branch Kotelnikov Institute of Radio Engineering and Electronics of RAS

Email: sva278@ire216.msk.su
Vvedensky Squar., 1, Fryazino, Moscow region, 141190 Russian Federation

V. Luzanov

Fryazino branch Kotelnikov Institute of Radio Engineering and Electronics of RAS

Email: sva278@ire216.msk.su
Vvedensky Squar., 1, Fryazino, Moscow region, 141190 Russian Federation

V. Zhitov

Fryazino branch Kotelnikov Institute of Radio Engineering and Electronics of RAS

Email: sva278@ire216.msk.su
Vvedensky Squar., 1, Fryazino, Moscow region, 141190 Russian Federation

L. Zaharov

Fryazino branch Kotelnikov Institute of Radio Engineering and Electronics of RAS

Email: sva278@ire216.msk.su
Vvedensky Squar., 1, Fryazino, Moscow region, 141190 Russian Federation

V. Kotov

Fryazino branch Kotelnikov Institute of Radio Engineering and Electronics of RAS

Autor responsável pela correspondência
Email: sva278@ire216.msk.su
Vvedensky Squar., 1, Fryazino, Moscow region, 141190 Russian Federation

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